2012年新托福考试加分词辅导(15)
2 l5 J' R; [# q( o) vetch-proof 防腐蚀的" w; K) g/ a9 m$ ^
etchant 腐蚀剂
* q( {% }+ V5 }. ]etched cavity 蚀刻腔( d* g# S* i! T g, n* ?% f* y
etched mirror (reflector)蚀刻反射镜3 {! X: z5 k1 `% [
etcher 蚀刻器) V0 E. o: f. K2 p
etching (1)蚀刻(2)刻线
* g1 t1 D Z. w% t# j1 k/ K- @etching agent 蚀刻剂4 e: M: O0 l5 v" C- b4 i3 e6 K( _+ J
etching figure 蚀刻图
& u. n% q E2 P- t' C2 q9 ?etching liquids 侵蚀液) D8 o* k7 d' P! x
etching machines 蚀刻设备/ b, a3 v5 T5 ]
etching process chemical 蚀刻制程化学品8 u' j5 N/ `( d) _
etching services 蚀刻服务
$ s# P3 i1 Z6 U8 q0 metendue 展度
* ?+ |: ]( ]: _: ?- v1 iethanol 乙醇,酒精
& g! C2 a( d) e- Q1 Lethced grating 蚀刻光栅
) k. v% `( U T9 W0 ^2 F& q" O8 _ether (1)醚,乙醚(2)以太4 }' A7 E+ d) f' v" t( F
ether drift 以太漂移
; [6 r* [6 t6 a4 R# o* C7 R; `; O5 y; ]ether wave 以太波( q) M2 E' w7 u% j
ethoxyline 环氧树脂
5 n& f6 C0 V7 `7 w' yethyl 乙基来自www.Examw.com
7 l6 h- n0 N9 Y5 i, tethyl alcohol 乙醇,酒精
+ t; Y7 R0 e, G8 q5 fethyl clinnamate 乙基内桂酸盐
/ G3 z; ^1 m3 Dethylylene 乙烯
5 c4 k/ b7 \6 m) o8 Reuphenies 遗传工程学
- S* u7 K, J+ c9 ]/ V, Qeuropium (Eu)铕
& A, y. R8 y' o4 U7 Leuropkium-activated 铕激活的: F( \# m; t3 @1 [, X8 o* t6 ~7 j- ~
Euthyscope 直视镜2 ^: n7 h4 e1 g" e# k/ A' B+ \7 U+ r
EUV laser 极远紫外激光器
/ G" R. S$ C4 @5 w! Levacuated chamber 真空室
3 L+ `5 B+ E* S/ uevacuated housing 真空罩8 j8 S% K: W! F+ e5 j4 M/ C5 Y
evacuation 排气,抽空 |